Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

PDF) Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Nanomaterials, Free Full-Text

PDF) Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Micromachines, Free Full-Text

Nanomaterials, Free Full-Text

The lateral correlation length ␰ versus film thickness d

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

Hydrogen bonding in hydrogenated amorphous silicon thin films prepared at different precursor gas temperatures with undiluted silane

PDF] Moisture Resistance of Insulating Films for Compound Semiconductor Devices

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

Silicone encapsulation of thin-film SiOx, SiOxNyand SiC for modern electronic medical implants: a comparative long-term ageing study. - Abstract - Europe PMC

PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition